Development of microstructure control methods for solidification and casting processes of metallic materials, which is essential for optimizing their quality and performance.
Analysis of the dynamics of the solid-liquid interface reaction during crystal growth process of semiconductor materials.
Direct observation and quantitative analysis of solidification and crystal growth dynamics from molten state using time-resolved and in-situ synchrotron radiation X-ray imaging.
Development of multi-modal and trans-scale synchrotron radiation X-ray high-temperature imaging techniques.
